APO RESEARCH · REPORT
Sputtering Target for Semiconductor
The sputtering target material is the core of semiconductor wafer manufacturing, and the chip has very high requirements for sputtering target material, which requires high purity of target material, generally over 99.999%.
Product & engineering
Understand the product.
The sputtering target material is the core of semiconductor wafer manufacturing, and the chip has very high requirements for sputtering target material, which requires high purity of target material, generally over 99.999%.
Selected research
Market Structure
Global Sputtering Target for Semiconductor Market by Size, by Type, by Application, by Region, History and Forecast 2021-2032
Market perspective
The sputtering target material is the core of semiconductor wafer manufacturing, and the chip has very high requirements for sputtering target material, which requires high purity of target material, generally over 99.999%.
As for global Sputtering Target for Semiconductor market, there are several key players, like Materion (Heraeus), JX Nippon Mining & Metals Corporation, Praxair, Plansee SE, Hitachi Metals, Honeywell, TOSOH, Sumitomo Chemical, ULVAC, Ningbo Jiangfeng, Luvata, GRIKIN Advanced Material, Luoyang Sifon Electronic Materials, FURAYA Metals, Advantec, Fujian Acetron New Materials Co., Ltd, Umicore Thin Film Products, Angstrom Sciences, Changzhou Sujing Electronic Material, etc.
Asia-Pacific is the largest consumption region of Sputtering Target for Semiconductor, with a consumption market share nearly 52%. The second place is North America; following Asia-Pacific with the consumption market share over 23%.
Read the full market overview
The report provides an overview of the global Sputtering Target for Semiconductor market in terms of capacity, output, revenue, and price, analyzing global market trends using historical revenue and sales data for 2021-2025, estimates for 2026, and projected CAGRs through 2032.
The study covers key producers of Sputtering Target for Semiconductor and consumption patterns in major regions and countries, assesses future market potential, and highlights priority regions and countries for segmenting the market into sub-sectors, with country-specific market value data for the U.S., Canada, Mexico, Brazil, China, Japan, South Korea, Southeast Asia, India, Germany, the U.K., Italy, the Middle East, Africa, and other countries.
The report also presents Sputtering Target for Semiconductor sales, revenue, market share, and industry ranking for the main manufacturers for 2021-2026, identifies the major stakeholders in the global market, and analyzes their competitive landscape and market positioning based on recent developments and segmental revenues.
In addition, the report analyzes segment data by type and application—covering sales, revenue, and price—for 2021-2032, and evaluates and forecasts the Sputtering Target for Semiconductor market size, projected growth trends, production technologies, key applications, and end-use industries.
Sputtering Target for Semiconductor Segment by Company
Materion (Heraeus)
JX Nippon Mining & Metals Corporation
Praxair
Plansee SE
Hitachi Metals
Honeywell
TOSOH
Sumitomo Chemical
ULVAC
Ningbo Jiangfeng
Luvata
GRIKIN Advanced Material
Luoyang Sifon Electronic Materials
FURAYA Metals
Advantec
Fujian Acetron New Materials Co., Ltd
Umicore Thin Film Products
Angstrom Sciences
Changzhou Sujing Electronic Material
Sputtering Target for Semiconductor Segment by Type
Metal Target
Alloy Target
Ceramic Compound Target
Sputtering Target for Semiconductor Segment by Application
Consumer Electronics
Vehicle Electronics
Communication Electronics
Others
Sputtering Target for Semiconductor Segment by Region
North America
United States
Canada
Mexico
Europe
Germany
France
U.K.
Italy
Russia
Spain
Netherlands
Switzerland
Sweden
Poland
Asia-Pacific
China
Japan
South Korea
India
Australia
Taiwan
Southeast Asia
South America
Brazil
Argentina
Chile
Middle East & Africa
Egypt
South Africa
Israel
Türkiye
GCC Countries
Study Objectives
1. To analyze and research the global status and future forecast, involving, production, value, consumption, growth rate (CAGR), market share, historical and forecast.
2. To present the key manufacturers, capacity, production, revenue, market share, and Recent Developments.
3. To split the breakdown data by regions, type, manufacturers, and Application.
4. To analyze the global and key regions market potential and advantage, opportunity and challenge, restraints, and risks.
5. To identify significant trends, drivers, influence factors in global and regions.
6. To analyze competitive developments such as expansions, agreements, new product launches, and acquisitions in the market.
Reasons to Buy This Report
1. This report will help the readers to understand the competition within the industries and strategies for the competitive environment to enhance the potential profit. The report also focuses on the competitive landscape of the global Sputtering Target for Semiconductor market, and introduces in detail the market share, industry ranking, competitor ecosystem, market performance, new product development, operation situation, expansion, and acquisition. etc. of the main players, which helps the readers to identify the main competitors and deeply understand the competition pattern of the market.
2. This report will help stakeholders to understand the global industry status and trends of Sputtering Target for Semiconductor and provides them with information on key market drivers, restraints, challenges, and opportunities.
3. This report will help stakeholders to understand competitors better and gain more insights to strengthen their position in their businesses. The competitive landscape section includes the market share and rank (in volume and value), competitor ecosystem, new product development, expansion, and acquisition.
4. This report stays updated with novel technology integration, features, and the latest developments in the market.
5. This report helps stakeholders to gain insights into which regions to target globally.
6. This report helps stakeholders to gain insights into the end-user perception concerning the adoption of Sputtering Target for Semiconductor.
7. This report helps stakeholders to identify some of the key players in the market and understand their valuable contribution.
Chapter Outline
Chapter 1: Provides an overview of the Sputtering Target for Semiconductor market, including product definition, global market growth prospects, production value, capacity, and average price forecasts (2021-2032).
Chapter 2: Analysis key trends, drivers, challenges, and opportunities within the global Sputtering Target for Semiconductor industry.
Chapter 3: Detailed analysis of Sputtering Target for Semiconductor market competition landscape. Including Sputtering Target for Semiconductor manufacturers' output value, output and average price from 2021 to 2026, as well as competition analysis indicators such as origin, product type, application, merger and acquisition information, etc.
Chapter 4: Provides the analysis of various market segments by type, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different market segments.
Chapter 5: Provides the analysis of various market segments by application, covering the market size and development potential of each market segment, to help readers find the blue ocean market in different downstream markets.
Chapter 6: Provides profiles of key players, introducing the basic situation of the main companies in the market in detail, including product production/output, value, price, gross margin, product introduction, recent development, etc.
Chapter 7: Production/Production Value of Sputtering Target for Semiconductor by region. It provides a quantitative analysis of the market size and development potential of each region in the next six years.
Chapter 8: Consumption of Sputtering Target for Semiconductor in regional level and country level. It provides a quantitative analysis of the market size and development potential of each region and its main countries and introduces the market development, future development prospects, market space, and production of each country in the world.
Chapter 9: Analysis of industrial chain, including the upstream and downstream of the industry.
Chapter 10: Concluding Insights of the report.
More report detail
Tables and figures
Scope & coverage.
Types
- Metal Target
- Alloy Target
- Ceramic Compound Target
Applications
- Consumer Electronics
- Vehicle Electronics
- Communication Electronics
- Others
Companies covered
- Materion (Heraeus)
- JX Nippon Mining & Metals Corporation
- Praxair
- Plansee SE
- Hitachi Metals
- Honeywell
- TOSOH
- Sumitomo Chemical
- ULVAC
- Ningbo Jiangfeng
- Luvata
- GRIKIN Advanced Material
- Luoyang Sifon Electronic Materials
- FURAYA Metals
- Advantec
- Fujian Acetron New Materials Co., Ltd
- Umicore Thin Film Products
- Angstrom Sciences
- Changzhou Sujing Electronic Material
Inside the report.
1 Market Overview
- 1.1 Product Definition
- 1.2 Global Market Growth Prospects
- 1.2.1 Global Sputtering Target for Semiconductor Production Value Estimates and Forecasts (2021-2032)
- 1.2.2 Global Sputtering Target for Semiconductor Production Capacity Estimates and Forecasts (2021-2032)
- 1.2.3 Global Sputtering Target for Semiconductor Production Estimates and Forecasts (2021-2032)
- 1.2.4 Global Sputtering Target for Semiconductor Market Average Price (2021-2032)
- 1.3 Assumptions and Limitations
- 1.4 Study Goals and Objectives
2 Global Sputtering Target for Semiconductor Market Dynamics
- 2.1 Sputtering Target for Semiconductor Industry Trends
- 2.2 Sputtering Target for Semiconductor Industry Drivers
- 2.3 Sputtering Target for Semiconductor Industry Opportunities and Challenges
- 2.4 Sputtering Target for Semiconductor Industry Restraints
3 Sputtering Target for Semiconductor Market by Manufacturers
- 3.1 Global Sputtering Target for Semiconductor Production Value by Manufacturers (2021-2026)
- 3.2 Global Sputtering Target for Semiconductor Production by Manufacturers (2021-2026)
- 3.3 Global Sputtering Target for Semiconductor Average Price by Manufacturers (2021-2026)
- 3.4 Global Sputtering Target for Semiconductor Industry Manufacturers Ranking, 2024 VS 2025 VS 2026
- 3.5 Global Sputtering Target for Semiconductor Key Manufacturers Manufacturing Sites & Headquarters
- 3.6 Global Sputtering Target for Semiconductor Manufacturers, Product Type & Application
- 3.7 Global Sputtering Target for Semiconductor Manufacturers Established Date
- 3.8 Market Competitive Analysis
- 3.8.1 Global Sputtering Target for Semiconductor Market CR5 and HHI
- 3.8.2 Global Top 5 and 10 Sputtering Target for Semiconductor Players Market Share by Production Value in 2025
- 3.8.3 2025 Sputtering Target for Semiconductor Tier 1, Tier 2, and Tier 3
4 Sputtering Target for Semiconductor Market by Type
- 4.1 Sputtering Target for Semiconductor Type Introduction
- 4.1.1 Metal Target
- 4.1.2 Alloy Target
- 4.1.3 Ceramic Compound Target
- 4.2 Global Sputtering Target for Semiconductor Production by Type
- 4.2.1 Global Sputtering Target for Semiconductor Production by Type (2021 VS 2025 VS 2032)
- 4.2.2 Global Sputtering Target for Semiconductor Production by Type (2021-2032)
- 4.2.3 Global Sputtering Target for Semiconductor Production Market Share by Type (2021-2032)
- 4.3 Global Sputtering Target for Semiconductor Production Value by Type
- 4.3.1 Global Sputtering Target for Semiconductor Production Value by Type (2021 VS 2025 VS 2032)
- 4.3.2 Global Sputtering Target for Semiconductor Production Value by Type (2021-2032)
- 4.3.3 Global Sputtering Target for Semiconductor Production Value Market Share by Type (2021-2032)
5 Sputtering Target for Semiconductor Market by Application
- 5.1 Sputtering Target for Semiconductor Application Introduction
- 5.1.1 Consumer Electronics
- 5.1.2 Vehicle Electronics
- 5.1.3 Communication Electronics
- 5.1.4 Others
- 5.2 Global Sputtering Target for Semiconductor Production by Application
- 5.2.1 Global Sputtering Target for Semiconductor Production by Application (2021 VS 2025 VS 2032)
- 5.2.2 Global Sputtering Target for Semiconductor Production by Application (2021-2032)
- 5.2.3 Global Sputtering Target for Semiconductor Production Market Share by Application (2021-2032)
- 5.3 Global Sputtering Target for Semiconductor Production Value by Application
- 5.3.1 Global Sputtering Target for Semiconductor Production Value by Application (2021 VS 2025 VS 2032)
- 5.3.2 Global Sputtering Target for Semiconductor Production Value by Application (2021-2032)
- 5.3.3 Global Sputtering Target for Semiconductor Production Value Market Share by Application (2021-2032)
6 Company Profiles
- 6.1 Materion (Heraeus)
- 6.1.1 Materion (Heraeus) Company Information
- 6.1.2 Materion (Heraeus) Business Overview
- 6.1.3 Materion (Heraeus) Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.1.4 Materion (Heraeus) Sputtering Target for Semiconductor Product Portfolio
- 6.1.5 Materion (Heraeus) Recent Developments
- 6.2 JX Nippon Mining & Metals Corporation
- 6.2.1 JX Nippon Mining & Metals Corporation Company Information
- 6.2.2 JX Nippon Mining & Metals Corporation Business Overview
- 6.2.3 JX Nippon Mining & Metals Corporation Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.2.4 JX Nippon Mining & Metals Corporation Sputtering Target for Semiconductor Product Portfolio
- 6.2.5 JX Nippon Mining & Metals Corporation Recent Developments
- 6.3 Praxair
- 6.3.1 Praxair Company Information
- 6.3.2 Praxair Business Overview
- 6.3.3 Praxair Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.3.4 Praxair Sputtering Target for Semiconductor Product Portfolio
- 6.3.5 Praxair Recent Developments
- 6.4 Plansee SE
- 6.4.1 Plansee SE Company Information
- 6.4.2 Plansee SE Business Overview
- 6.4.3 Plansee SE Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.4.4 Plansee SE Sputtering Target for Semiconductor Product Portfolio
- 6.4.5 Plansee SE Recent Developments
- 6.5 Hitachi Metals
- 6.5.1 Hitachi Metals Company Information
- 6.5.2 Hitachi Metals Business Overview
- 6.5.3 Hitachi Metals Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.5.4 Hitachi Metals Sputtering Target for Semiconductor Product Portfolio
- 6.5.5 Hitachi Metals Recent Developments
- 6.6 Honeywell
- 6.6.1 Honeywell Company Information
- 6.6.2 Honeywell Business Overview
- 6.6.3 Honeywell Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.6.4 Honeywell Sputtering Target for Semiconductor Product Portfolio
- 6.6.5 Honeywell Recent Developments
- 6.7 TOSOH
- 6.7.1 TOSOH Company Information
- 6.7.2 TOSOH Business Overview
- 6.7.3 TOSOH Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.7.4 TOSOH Sputtering Target for Semiconductor Product Portfolio
- 6.7.5 TOSOH Recent Developments
- 6.8 Sumitomo Chemical
- 6.8.1 Sumitomo Chemical Company Information
- 6.8.2 Sumitomo Chemical Business Overview
- 6.8.3 Sumitomo Chemical Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.8.4 Sumitomo Chemical Sputtering Target for Semiconductor Product Portfolio
- 6.8.5 Sumitomo Chemical Recent Developments
- 6.9 ULVAC
- 6.9.1 ULVAC Company Information
- 6.9.2 ULVAC Business Overview
- 6.9.3 ULVAC Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.9.4 ULVAC Sputtering Target for Semiconductor Product Portfolio
- 6.9.5 ULVAC Recent Developments
- 6.10 Ningbo Jiangfeng
- 6.10.1 Ningbo Jiangfeng Company Information
- 6.10.2 Ningbo Jiangfeng Business Overview
- 6.10.3 Ningbo Jiangfeng Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.10.4 Ningbo Jiangfeng Sputtering Target for Semiconductor Product Portfolio
- 6.10.5 Ningbo Jiangfeng Recent Developments
- 6.11 Luvata
- 6.11.1 Luvata Company Information
- 6.11.2 Luvata Business Overview
- 6.11.3 Luvata Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.11.4 Luvata Sputtering Target for Semiconductor Product Portfolio
- 6.11.5 Luvata Recent Developments
- 6.12 GRIKIN Advanced Material
- 6.12.1 GRIKIN Advanced Material Company Information
- 6.12.2 GRIKIN Advanced Material Business Overview
- 6.12.3 GRIKIN Advanced Material Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.12.4 GRIKIN Advanced Material Sputtering Target for Semiconductor Product Portfolio
- 6.12.5 GRIKIN Advanced Material Recent Developments
- 6.13 Luoyang Sifon Electronic Materials
- 6.13.1 Luoyang Sifon Electronic Materials Company Information
- 6.13.2 Luoyang Sifon Electronic Materials Business Overview
- 6.13.3 Luoyang Sifon Electronic Materials Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.13.4 Luoyang Sifon Electronic Materials Sputtering Target for Semiconductor Product Portfolio
- 6.13.5 Luoyang Sifon Electronic Materials Recent Developments
- 6.14 FURAYA Metals
- 6.14.1 FURAYA Metals Company Information
- 6.14.2 FURAYA Metals Business Overview
- 6.14.3 FURAYA Metals Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.14.4 FURAYA Metals Sputtering Target for Semiconductor Product Portfolio
- 6.14.5 FURAYA Metals Recent Developments
- 6.15 Advantec
- 6.15.1 Advantec Company Information
- 6.15.2 Advantec Business Overview
- 6.15.3 Advantec Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.15.4 Advantec Sputtering Target for Semiconductor Product Portfolio
- 6.15.5 Advantec Recent Developments
- 6.16 Fujian Acetron New Materials Co., Ltd
- 6.16.1 Fujian Acetron New Materials Co., Ltd Company Information
- 6.16.2 Fujian Acetron New Materials Co., Ltd Business Overview
- 6.16.3 Fujian Acetron New Materials Co., Ltd Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.16.4 Fujian Acetron New Materials Co., Ltd Sputtering Target for Semiconductor Product Portfolio
- 6.16.5 Fujian Acetron New Materials Co., Ltd Recent Developments
- 6.17 Umicore Thin Film Products
- 6.17.1 Umicore Thin Film Products Company Information
- 6.17.2 Umicore Thin Film Products Business Overview
- 6.17.3 Umicore Thin Film Products Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.17.4 Umicore Thin Film Products Sputtering Target for Semiconductor Product Portfolio
- 6.17.5 Umicore Thin Film Products Recent Developments
- 6.18 Angstrom Sciences
- 6.18.1 Angstrom Sciences Company Information
- 6.18.2 Angstrom Sciences Business Overview
- 6.18.3 Angstrom Sciences Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.18.4 Angstrom Sciences Sputtering Target for Semiconductor Product Portfolio
- 6.18.5 Angstrom Sciences Recent Developments
- 6.19 Changzhou Sujing Electronic Material
- 6.19.1 Changzhou Sujing Electronic Material Company Information
- 6.19.2 Changzhou Sujing Electronic Material Business Overview
- 6.19.3 Changzhou Sujing Electronic Material Sputtering Target for Semiconductor Production, Value and Gross Margin (2021-2026)
- 6.19.4 Changzhou Sujing Electronic Material Sputtering Target for Semiconductor Product Portfolio
- 6.19.5 Changzhou Sujing Electronic Material Recent Developments
7 Global Sputtering Target for Semiconductor Production by Region
- 7.1 Global Sputtering Target for Semiconductor Production by Region: 2021 VS 2025 VS 2032
- 7.2 Global Sputtering Target for Semiconductor Production by Region (2021-2032)
- 7.2.1 Global Sputtering Target for Semiconductor Production by Region (2021-2026)
- 7.2.2 Global Sputtering Target for Semiconductor Production Forecast by Region (2027-2032)
- 7.3 Global Sputtering Target for Semiconductor Production by Region: 2021 VS 2025 VS 2032
- 7.4 Global Sputtering Target for Semiconductor Production Value by Region (2021-2032)
- 7.4.1 Global Sputtering Target for Semiconductor Production Value by Region (2021-2026)
- 7.4.2 Global Sputtering Target for Semiconductor Production Value by Region (2027-2032)
- 7.5 Global Sputtering Target for Semiconductor Market Price Analysis by Region (2021-2032)
- 7.6 Regional Production Value Trends (2021-2032)
- 7.6.1 North America Sputtering Target for Semiconductor Production Value (2021-2032)
- 7.6.2 Europe Sputtering Target for Semiconductor Production Value (2021-2032)
- 7.6.3 Asia-Pacific Sputtering Target for Semiconductor Production Value (2021-2032)
- 7.6.4 South America Sputtering Target for Semiconductor Production Value (2021-2032)
- 7.6.5 Middle East & Africa Sputtering Target for Semiconductor Production Value (2021-2032)
8 Global Sputtering Target for Semiconductor Consumption by Region
- 8.1 Global Sputtering Target for Semiconductor Consumption by Region: 2021 VS 2025 VS 2032
- 8.2 Global Sputtering Target for Semiconductor Consumption by Region (2021-2032)
- 8.2.1 Global Sputtering Target for Semiconductor Consumption by Region (2021-2026)
- 8.2.2 Global Sputtering Target for Semiconductor Consumption by Region (2027-2032)
- 8.3 North America
- 8.3.1 North America Sputtering Target for Semiconductor Consumption Growth Rate by Country: 2021 VS 2025 VS 2032
- 8.3.2 North America Sputtering Target for Semiconductor Consumption by Country (2021-2032)
- 8.3.3 U.S.
- 8.3.4 Canada
- 8.3.5 Mexico
- 8.4 Europe
- 8.4.1 Europe Sputtering Target for Semiconductor Consumption Growth Rate by Country: 2021 VS 2025 VS 2032
- 8.4.2 Europe Sputtering Target for Semiconductor Consumption by Country (2021-2032)
- 8.4.3 Germany
- 8.4.4 France
- 8.4.5 U.K.
- 8.4.6 Italy
- 8.4.7 Netherlands
- 8.5 Asia Pacific
- 8.5.1 Asia Pacific Sputtering Target for Semiconductor Consumption Growth Rate by Country: 2021 VS 2025 VS 2032
- 8.5.2 Asia Pacific Sputtering Target for Semiconductor Consumption by Country (2021-2032)
- 8.5.3 China
- 8.5.4 Japan
- 8.5.5 South Korea
- 8.5.6 Southeast Asia
- 8.5.7 India
- 8.5.8 Australia
- 8.6 South America
- 8.6.1 South America Sputtering Target for Semiconductor Consumption Growth Rate by Country: 2021 VS 2025 VS 2032
- 8.6.2 South America Sputtering Target for Semiconductor Consumption by Country (2021-2032)
- 8.6.3 Brazil
- 8.6.4 Argentina
- 8.6.5 Chile
- 8.6.6 Colombia
- 8.7 Middle East & Africa
- 8.7.1 Middle East & Africa Sputtering Target for Semiconductor Consumption Growth Rate by Country: 2021 VS 2025 VS 2032
- 8.7.2 Middle East & Africa Sputtering Target for Semiconductor Consumption by Country (2021-2032)
- 8.7.3 Egypt
- 8.7.4 South Africa
- 8.7.5 Israel
- 8.7.6 Türkiye
- 8.7.7 GCC Countries
9 Value Chain and Sales Channels Analysis
- 9.1 Sputtering Target for Semiconductor Value Chain Analysis
- 9.1.1 Sputtering Target for Semiconductor Key Raw Materials
- 9.1.2 Raw Materials Key Suppliers
- 9.1.3 Manufacturing Cost Structure
- 9.1.4 Sputtering Target for Semiconductor Production Mode & Process
- 9.2 Sputtering Target for Semiconductor Sales Channels Analysis
- 9.2.1 Direct Comparison with Distribution Share
- 9.2.2 Sputtering Target for Semiconductor Distributors
- 9.2.3 Sputtering Target for Semiconductor Customers
10 Concluding Insights
11 Appendix
- 11.1 Reasons for Doing This Study
- 11.2 Research Methodology
- 11.3 Research Process
- 11.4 Authors List of This Report
- 11.5 Data Source
- 11.5.1 Secondary Sources
- 11.5.2 Primary Sources
- 11.6 Disclaimer
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