Chemical & Material
Ultra-High Purity Metal Sputtering Targets for Semiconductor Manufacturing
An ultra-high-purity metal sputtering target supplies metal to semiconductor thin films with controlled trace impurities; purity definition, microstructure and deposition conditions determine contamination and film behaviour.
- Types
- Copper and Copper-Alloy Targets · Aluminum and Aluminum-Alloy Targets · Barrier and Refractory Metal Targets
- Applications
- Logic and Foundry · Memory · Analog, Power, MEMS and Sensors
5 editions13 August 2026








