Machinery & Equipment
193nm Excimer Lasers
A 193 nm excimer laser is a pulsed deep-ultraviolet source using an excited argon-fluoride molecular complex as its gain medium. Although ArF is technically a heteronuclear exciplex, the equipment industry includes these sources under excimer lasers. An electrical discharge creates the transient excited species, which emit near 193 nm as they return to a dissociative lower state.
5 editions21 December 2025











