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Fluidized-Bed Chemical Vapor Deposition (FBCVD) reactor is a gas–solid processing vessel in which an upward flow of carrier and precursor gases suspends and continuously mixes solid particles while gaseous precursors undergo controlled chemical reactions to deposit solid material onto or within the particles. The fluidized state provides intensive gas–solid contact, uniform temperature distribution, and efficient heat and mass transfer, enabling homogeneous particle coating, material infiltration, particle growth, or catalytic synthesis under batch or continuous operation. FBCVD reactors are principally used in the production of silicon–carbon anode materials, carbon nanotubes, functional powder coatings, and granular polysilicon.
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