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Cryopump is a high vacuum pumping device that removes gas molecules from a vacuum chamber by capturing them on surfaces maintained at cryogenic temperatures. Its pumping action is produced by three principal mechanisms: cryocondensation, in which condensable gases freeze or liquefy on cold surfaces; cryosorption, in which light gases are adsorbed by porous materials such as activated charcoal at very low temperature; and cryotrapping, in which gas molecules become immobilized within previously condensed layers. A typical cryopump consists of a vacuum housing, a first stage radiation shield, a second stage cryogenic array, adsorbent coated surfaces, a cryocooler or continuous flow cooling circuit, temperature sensors, heaters, valves, and a regeneration control system. The first stage normally captures water vapor and shields the colder internal components from thermal radiation. The second stage captures nitrogen, oxygen, argon, carbon dioxide, hydrocarbons, and other condensable gases, while the adsorbent retains hydrogen, helium, and neon. Cryopumps operate without oil or other working fluids in the vacuum space and can provide high pumping speeds, low contamination, and pressures extending into the ultra high vacuum range. Their pumping capacity is finite because captured gases accumulate on the cold surfaces. Periodic regeneration is therefore required to warm the pump, release the retained gases, evacuate the internal volume, and restore pumping capacity. Cryopumps are widely used in semiconductor processing, flat panel display manufacturing, physical vapor deposition, optical coating, particle accelerators, fusion systems, space simulation chambers, and scientific vacuum equipment.
